Abstract
Technologically important low-resistivity bulk Si has been usually produced by the traditional Czochralski growth method. We now explore a novel method to obtain low-resistivity bulk Si by hot-pressing B- and P-hyperdoped Si nanocrystals (NCs). In this work bulk Si with the resistivity as low as ∼ 0.8 (40) mΩ•cm has been produced by hot pressing P (B)-hyperdoped Si NCs. The dopant type is found to make a difference for the sintering of Si NCs during the hot pressing. Bulk Si hot-pressed from P-hyperdoped Si NCs is more compact than that hot-pressed from B-hyperdoped Si NCs when the hot-pressing temperature is the same. This leads to the fact that P is more effectively activated to produce free carriers than B in the hot-pressed bulk Si. Compared with the dopant concentration, the hot-pressing temperature more significantly affects the structural and electrical properties of hot-pressed bulk Si. With the increase of the hot-pressing temperature the density of hot-pressed bulk Si increases. The highest carrier concentration (lowest resistivity) of bulk Si hot-pressed from B- or P-hyperdoped Si NCs is obtained at the highest hot-pressing temperature of 1050 °C. The mobility of carriers in the hot-pressed bulk Si is low (≤ ∼ 30 cm-2V-1s-1) mainly due to the scattering of carriers induced by structural defects such as pores.
Highlights
The demand for low-resistivity bulk Si has been increasing because of the development of a series of Si-based technologies such as power devices[1,2] and discharge electrodes.[3]
Bulk Si hot-pressed from P-hyperdoped Si NCs is more compact than that hot-pressed from B-hyperdoped Si NCs when the hot-pressing temperature is the same
The highest carrier concentration of bulk Si hot-pressed from B- or P-hyperdoped Si NCs is obtained at the highest hot-pressing temperature of 1050 ◦C
Summary
The demand for low-resistivity bulk Si has been increasing because of the development of a series of Si-based technologies such as power devices[1,2] and discharge electrodes.[3]. Low-resistivity bulk Si is usually obtained by the Czochralski growth of Si ingots with doping levels approaching the solubility limits of dopants.[5–8]. The very high doping levels significantly complicate the growth of Si ingots, rendering relatively high cost for low-resistivity bulk Si. It has been recently shown that Si nanocrystals (NCs) may be hyperdoped with doping levels exceeding the solubility limits of dopants in a nonthermal process.[9–12]. It has been recently shown that Si nanocrystals (NCs) may be hyperdoped with doping levels exceeding the solubility limits of dopants in a nonthermal process.[9–12] This brings a new opportunity for the preparation of low-resistivity bulk Si. It is possible that low-resistivity bulk Si is obtained by sintering hyperdoped Si NCs. preparation of low-resistivity bulk Si by intentionally using B- and P-hyperdoped Si NCs. Differences in the structural and electrical properties between bulk Si sintered from B-hyperdoped Si NCs and that sintered from P-hyperdoped Si NCs are examined. The effects of the B/P concentration of Si NCs on the sintering process of Si NCs and the electrical properties of the resulting bulk Si are discussed
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