Abstract
The third part of the paper is devoted to an investigation of the so-called helicon plasma sources. These are RF devices operating with a relatively weak external magnetic field, which is, at the same time, strong enough for the resonant electron gyrofrequency to be much higher than the industrial frequency (ω=8.52×107 s−1). As in [1, 2], a study is made of elongated cylindrical plasma sources in a longitudinal (directed along the cylinder axis) magnetic field and planar disk-shaped plasma sources in a transverse (perpendicular to the plane of the disk) magnetic field. A comparison of the present results with the results that were obtained in [3] without using the helicon approximation leads to the conclusion that elongated helicon sources hold great promise for plasma technologies.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.