Abstract
The low-frequency (LF) noise in p-channel bulk Multiple-Gate Field-Effect Transistors (MuGFETs) with 2.5 nm SiON gate oxide has been investigated in the ohmic regime from weak to strong inversion. It is shown that both 1/f-like noise and Generation-Recombination (GR) noise are present, giving rise to a wide device-to-device scatter in the spectral density. The 1/f noise is dominated by number fluctuations from which an effective trap density in the range 5×1017 cm-3eV-1 has been derived. At the same time, it is demonstrated that the GR noise originates from traps in the gate oxide.
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