Low-Energy Scanning Electron Microscope for Nanolithography

Abstract

We present a new low-energy (~300 eV) scanning electron microscope with 30-nm resolution. The instrument operates with a flat integrated chip lens which performs electron extraction, e-beam focusing and deflection. An important feature is that the electron emitter is positioned 1-2 mm away from the extractor anode (consisting of an aperture of 1 μm diameter), so that their precise alignment is not necessary. The extension of the application of the instrument to a multicolumn array of electron beams for multipattern writing is quite feasible.