Abstract
Low temperature surface passivation is a process that has a potential to reduce the input energy cost of the solar cell with minimum modification of the manufacturing bed, while keeping the efficiency, and life of the cells within acceptable range of values. In this review, low temperature deposition methods of SiO2, Al2O3, a-Si:H, silicon nano particles (NPs), and organic materials, are considered. Surface recombination velocities, defect densities, stability of these passivating layers are discussed along with the mechanisms of passivation on Si surface.
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