Abstract
Effects of periodic curvature on the electrical resistivity of corrugated semiconductor films are theoretically considered. The presence of a curvature-induced potential affects the motion of electrons confined to the thin curved film, resulting in a significant resistivity enhancement at specific values of two geometric parameters: the amplitude and period of the surface corrugation. The maximal values of the two parameters in order to observe the corrugation-induced resistivity enhancement in actual experiments are quantified by employing existing material constants.
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