Abstract
Film formation in low-temperature plasma in the pulsed mode was studied. The voltage’s pulse sequence in the sputtering system contained trains of short and long pulses; the short pulse time was chosen shorter than the stabilization time of the glow discharge mode. The formation of the nanoscale composition periodicity in grown films was confirmed by secondary-ion mass spectrometry. Photoluminescence of the films synthesized in the pulsed mode was studied, as well as the possibility of controlling the luminescence behavior and intensity.
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