Abstract
AbstractAtmospheric pressure glow discharge plasma CVD was used to deposit thin films of titania at 200 °C using two different precursors. The resulting films were characterised using techniques including XPS, RBS and XRD. It was established that annealing at temperatures as low as 275 °C produced crystalline films that were photocatalytically active. When annealed at 300 °C the photoactivity was greater than that of commercially available “self‐cleaning” titania films. The effects of the different precursors, annealing times and temperatures on the crystallinity and photoactivity are discussed.magnified image
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