Abstract
The effects of incorporating low-temperature-grown GaAs (LT GaAs) into the layer structure of Al0.98Ga0.02As/GaAs are studied. Results show that the structures containing a 300 nm layer of LT GaAs have faster oxidation rates and lower oxidation temperatures compared to reference samples without the LT GaAs layer. This letter will discuss the mechanisms involved in the oxidation rate increase, attributed to the LT GaAs enhancing the transport of As species during the oxidation process.
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