Abstract
Well-aligned nanocrystalline (nc)-Si/SiOx composite nanowires have been deposited on various substrates at 120 °C using SiCl4/H2 in a hot-filament chemical vapor deposition reactor. Structural and compositional analyses reveal that silicon nanocrystals are embedded in the amorphous SiOx nanowires. The nc-Si/SiOx composite nanowires are transparent in the range 500–900 nm. Photoluminescence spectra of the nc-Si/SiOx composite nanowires have a broad emission band, ranging from 420 to 525 nm. Water vapor from the chamber wall plays a crucial role in the formation of the well-aligned nanowires. A possible mechanism for the formation of the composite nanowires is suggested.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
