Abstract

In this paper, a novel method of producing nanoparticles at low temperatures using hydrogen bombardment of thin films, deposited on glass substrates, is introduced. Silver nanoparticles were obtained by this method in our Plasma Enhanced Chemical Vapor Deposition system. Optical and morphological characteristics of these nanoparticles were extensively studied for various conditions of plasma treatment, such as plasma power density, temperature, duration of hydrogen bombardment, thickness of the initial thin metallic film etc. In addition, Ag-Cu alloy nanoparticles on glass substrates were also achieved. The process of nanoparticle formation in this method shows that several kinds of metals and semiconductors nanoparticles can be obtained using this approach. Scanning Electron Microscopy, Atomic Force Microscopy and Transmission Electron Microscopy were used to analyze the nanostructures.

Highlights

  • Because of their linear and nonlinear optical properties, metal nanoparticles have been widely studied in recent years

  • Silver nanoparticles were obtained by this method in our Plasma Enhanced Chemical Vapor Deposition system

  • The work started by cleaning the glass substrate in the standard RCA1 solution, which contained NH3/ H2O2/DI-H2O with relative volume proportions of 1:1:5, and followed by the deposition of a thin layer of silver with the thickness of about 10 nm in a thermal evaporation system at the base pressure of 5 × 10−6 torr [Formation of bimetallic alloy nanoparticles needs to evaporate two metallic sources simultaneously in the physical vapor deposition (PVD) system]

Read more

Summary

Introduction

Because of their linear and nonlinear optical properties, metal nanoparticles have been widely studied in recent years. They are suitable candidates for various devices because of their unique optical [1], electronic [2], catalysis [3], chemical [4] properties. Silver nanoparticles and bimetallic alloy of silver-copper nanoparticles were produced by this plasma treatment method. This method can be used for the formation of other metallic or semiconductors nanoparticles by PVD method on glass or silicon or other substrates, out of which two examples of nickel and silicon nanoparticles are presented.

Experimental
Results and Discussion
Conclusion
Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call