Abstract
We find that NO dosed on rutile TiO2(110)-1 × 1 at substrate temperatures as low as 50 K readily reacts to produce N2O, which desorbs promptly from the surface leaving an oxygen adatom behind. The desorption rate of N2O reaches a maximum value after 1–2 s at an NO flux of 1.2 × 1014 NO/cm2·sec and then decreases rapidly as the initially clean, reduced TiO2(110) surface with ∼5% oxygen vacancies (VO’s) becomes covered with oxygen adatoms and unreacted NO. The maximum desorption rate is also found to increase as the substrate temperature is raised up to about 100 K. Interestingly, the N2O desorption during the low-temperature (LT) NO dose is strongly suppressed when molecular oxygen is predosed, whereas it persists on the surface with VO’s passivated by surface hydroxyls. Our results show that the surface charge, not the VO sites, plays a dominant role in the LT N2O desorption induced by a facile NO reduction at such low temperatures.
Published Version
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