Abstract
The deposition characteristics of (BST) thin films with direct liquid injection metallorganic chemical vapor deposition on a wafer were investigated. A single cocktail solution of (methd = methoxyethoxytetramethylheptanedionate), and (mpd = methylpentanediol, tmhd = tetramethylheptanedionate) with methanol solvent was used as a precursor. as a Ti precursor showed better thermal stability than did and alleviated Ti-rich hump regions due to the weak Ti-(i-OPr) bond strength of Some haziness in the film was observed when the reactor pressure was increased. Conformal step coverage and good electric properties (leakage less than at 1 V) were obtained. © 2001 The Electrochemical Society. All rights reserved.
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