Abstract
A new 4-layer antireflective (AR) stack with a low sheet resistance and high transmittance has been developed. The deposited AR stack has a layer construction of 68 nm SiO 2/9 nm ZnO:2.3 at.% Al/5 nm Ag/33 nm ZnO:2.3 at.% Al/glass and excellent AR properties, visible transmittance (85.0%), visible reflectance (0.34%) and 0.6% bandwidth ratio (1.87). Its sheet resistance is 23.3 Ω and adjustable from 16 to 30 Ω while maintaining good AR properties. Two ways to improve the chemical and mechanical durability of the AR stack were proposed; one is doping of gold into silver; the other is self-graded over-coating with fluorocarbon layer/binding layer/hydrocarbon polymer layer.
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