Abstract
Thin films of CrO 2 on single crystal plates of Al 2O 3 were grown by a vapor deposition process in sealed silica tubes. CrO 2Cl 2 was formed from CrCl 3 . 6H 2O and CrO 3 in one zone at 250 °C and decomposed to yield CrO 2 in a second zone at 380 °C. The overall pressure was less than 3 atm. The films were characterized by optical and electron microscopy, by X-ray analysis, by magnetic behavior and optical absorption.
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