Low-power RF plasma sources for technological applications: II. plasma sources under anomalous skin effect conditions

Abstract

A theory of a planar disk-shaped RF plasma source under anomalous skin effect conditions is developed. In the absence of an external magnetic field, such conditions are satisfied for transverse electromagnetic waves with phase velocities below the electron thermal velocity, and, in the presence of this field, they are satisfied for electron cyclotron waves with frequencies corresponding to the resonant absorption line. For each of these cases, the RF field power deposited in a plasma with given parameters is determined and the equivalent plasma resistance is calculated.