Abstract
The resistivity of transparent conductive thin film formed by sputtering exhibits a dependence on film thickness. In this study, an analysis by electromagnetic field simulation of resistance effect on the transmission characteristics was carried out. The overall resistance of the signal waveguide governs the transmission characteristics, and variation of the resistance at the interface between the substrate and the thin film has no significant effect. We evaluated a structure in which fine metal wiring that is not visible to the eye is placed on transparent conductors to reduce the resistance of the transmitting waveguide. Electromagnetic field simulations suggest that this structure improves the transmission characteristics while keeping high transparency.
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