Low-loss passive waveguides in a generic InP foundry process via local diffusion of zinc.

Domenico D’Agostino,Giuseppe Carnicella,Caterina Ciminelli,Huub Ambrosius,Meint Smit,Peter Thijs,Petrus J Veldhoven

doi:10.1364/oe.23.025143

Domenico D’Agostino, Giuseppe Carnicella + Show 5 more

Open Access

https://doi.org/10.1364/oe.23.025143

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Abstract

Generic InP foundry processes allow monolithic integration of active and passive elements into a common p-n doped layerstack. The passive loss can be greatly reduced by restricting the p-dopant to active regions. We report on a localized Zn-diffusion process based on MOVPE, which allows to reduce waveguide loss from 2 dB/cm to below 0.4 dB/cm. We confirm this value by fabrication of a 73 mm long spiral ring resonator, with a record quality factor of 1.2 million and an extinction ratio of 9.7 dB.

Highlights

The loss of passive waveguides is an important performance parameter of photonic integration platforms, especially for large scale photonic integrated circuits (PICs) [1, 2] and components as delay lines or resonators. The latter are relevant for demanding sensing applications as integrated optical gyroscopes, where waveguide loss limits the sensitivity [3]
These results show excellent agreement with the simulated values listed in Table 1 for a 600 nm thick guiding layer
The loss in the passive waveguides is reduced from 2 dB/cm to 0.4 dB/cm and is in excellent agreement with our simulations

Summary

Introduction

The loss of passive waveguides is an important performance parameter of photonic integration platforms, especially for large scale photonic integrated circuits (PICs) [1, 2] and components as delay lines or resonators. Citation for published version (APA): D'Agostino, D., Carnicella, G., Ciminelli, C., Thijs, P., van Veldhoven, P. Low-loss passive waveguides in a generic InP foundry process via local diffusion of zinc.

Results

Conclusion