Abstract
The arrayed waveguide grating (AWG) device was fabricated on a 4 inch Si substrate using the planar lightwave circuit technology that consists of the flame hydrolysis deposition method and the inductively coupled plasma etching process. The average insertion loss, spectrum at the center channel, loss uniformity, nonadjacent crosstalk and polarization dependent loss (PDL) were measured and were in good agreement with the simulated transmission spectra.
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