Low-Energy Electron Induced X-Ray Spectroscopy (LEEIXS), An Emerging Technique in Surface and Thin-Film Analysis. New Developments and Applications

Abstract

Within the last two decades analysis and characterization of surfaces, interfaces and very thin films have become of considerable importance in many fields of modern technology. This increasing demand has lead to a rapid development of various surface and near-surface analytical techniques. Some of these methods such as XPS, AES, SIMS and ISS have matured both with respect to instrumentation and methodology and therefore are now sufficiently well-established. Others are yet in their infancy but possess a large potential and this is the case of low-energy electron induced x-ray spectrometry (LEEIXS) discussed hereafter.The instrument is a wavelength-dispersive x-ray spectrometer in which the conventional x-ray tube has been replaced by an electronically stabilized gas-discharge source. Such a system operates as an electron source under the primary vacuum of the spectrometer (≃ 10−1 torr). Typical operating conditions are in the range 0.5-5 kV with a current of 0.1-0.5 mA and the diameter of the electron beam at the sample surface is less than 1 cm2.