Low energy argon differential sputtering yields and thresholds along the 〈110〉 and 〈100〉 directions from single crystal silver surfaces

Abstract

Abstract The relative differential sputtering yields, dS, in a fixed small solid angle at various directions from a single crystal silver target under normal Ar+ ion bombardment (ion energy from threshold to about 100 eV) have been measured. The yields measured in the directions of various sputtering “spots” were: dS 1 in the 〈110〉 direction at about 60° from the (110) face;dS 2, 〈110〉 direction, 45° from (100) face;dS 3, 〈110〉 direction, 35° from (111) face;dS 4, 〈110〉 direction, normal to (110) face; and dS 5, 〈100〉 direction, normal to the (100) face. The magnitudes of the yields were: dS 1 ≃ dS 2 > dS 3. An order of magnitude lower were: dS 4 > dS 5. For the oblique 〈110〉 emissions, the curves of (dS) 1/2 vs. incident ion energy were linear for ion energies of about 20–50 eV; extrapolation of these curves to zero yield gave the following sputtering threshold energies: dS 1, 14 eV; dS 2, 18 eV; and dS 3, 23 eV.