Abstract

As one kind of transparent conductive electrodes (TCEs), transparent conductive oxides (TCOs) have been widely used in perovskite solar cells (PSCs). However, the conventional magnetron sputtering usually causes high-energy particles, thus damaging the underlying functional films and deteriorating the performance of devices. Therefore, developing a low-damage method for high-quality TCO film is crucial. Here, the hydrogen and cerium co-doped indium oxide (ICO:H) films were prepared by the reactive plasma deposition (RPD) technology at room temperature. Benefiting from the hydrogen doping, the bandgap of the ICO:H film was tuned to 3.97 eV, the average transmittances reached 91.25% (from 800 nm to 1200 nm) and 81.35% (from 300 nm to 800 nm), and the carrier mobility exceeded 30 cm2/V/s. Combined with these advantages, semitransparent perovskite solar cells (ST-PSCs) without buffer layers were fabricated using ICO:H films as transparent conductive window layers, and the power conversion efficiency (PCE) was up to 17.61% (from the glass side). Furthermore, the ICO:H films were also applied in two-terminal perovskite/silicon tandem solar cells, and the PCE exceeded 25%. This low-damage method opens a new avenue for fabricating film-based optoelectronics.

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