Abstract
We present a loss-coupled distributed feedback microlaser, monolithically grown on a standard 300-mm Si wafer using nano-ridge engineering. The cavity is formed by integrating a metallic grating on top of the nano-ridge. This allows forming a laser cavity without etching the III-V material, avoiding damaged interfaces and the associated carrier loss. Simulations, supported by experimental characterisation of the modal gain of the nano-ridge devices, predict an optimal duty cycle for the grating of ~0.4, providing a good trade-off between coupling strength and cavity loss for the lasing mode. The model was experimentally verified by characterising the lasing threshold and external efficiency of devices exhibiting gratings with varying duty cycle. The high modal gain and low threshold obtained prove the excellent quality of the epitaxial material. Furthermore, the low loss metal grating might provide a future route to electrical injection and efficient heat dissipation of these nanoscale devices.
Highlights
Silicon photonics is considered to be one of the key technology platforms in meeting the future requirements of power-efficient and high-density interconnects but the lack of an efficient and cost-efficient light source directly integrated with the platform remains a bottleneck
We present a loss-coupled distributed feedback microlaser, monolithically grown on a standard 300-mm Si wafer using nano-ridge engineering
In this paper we report the first single-mode, partly loss-coupled distributed feedback (DFB) InGaAs/GaAs multi-QW nano-ridge lasers monolithically grown on a standard 300-mm Si wafer
Summary
Silicon photonics is considered to be one of the key technology platforms in meeting the future requirements of power-efficient and high-density interconnects but the lack of an efficient and cost-efficient light source directly integrated with the platform remains a bottleneck. In one group of approaches, confined growth in a trench or V-groove is used to suppress defects This allows to reduce the thickness of the required buffer layer considerably, providing prospects for coupling light with waveguides defined on the same substrate. By carefully selecting the duty cycle of the metal grating, the modal loss of the lasing mode is reduced to 23 dB/cm (compared to >300dB/cm for a continuous metal contact). Compared to an etched grating, the metallic grating cavity allows to avoid material damage and related carrier loss induced by the etching process, and has the potential to serve as a pathway for electrical pumping the device in the future
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