Abstract
In this work we report on the long-term stability of black silicon surfaces passivated with atomic layer deposited (ALD) 20nm thick Al2O3 films on p- and n-type FZ c-Si substrates. The results are directly compared with random pyramid textured counterparts. The effective surface recombination velocity Seff has been measured within a time frame of one year after activation of surface passivation. The results demonstrate that after an initial slight degradation during the first month Seff values stabilize around 45 and 25cm/s on p- and n-type black silicon samples, respectively. These values are enough to guarantee stable high efficiency in interdigitated back-contacted (IBC) c-Si(n) solar cells (> 24.5%) using black silicon nanostructures on the front side. Similar, although weaker, losses are also observed in surface passivation on textured samples covered by Al2O3 with equal thickness, indicating that the origin of the instability might be independent of surface morphology.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.