Abstract
In application of focused-ion-beam lithography and grazing Ar+ milling on the U-shape barrier layer of anodic alumina nanochannels, we fabricated a hexagonally symmetry aperture array with nominal diameter of 12±2nm and interspacing of 100±2nm. Besides long-range spatial ordering, the focused-ion-beam guided-grown process has also significantly improved uniformity of both the interpore spacing and the aperture size. This aperture array membrane can be applied to the fabrication of nanostructures, such as a lithographic contact mask for ordered quantum-dot array.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
