Abstract

Transition metal dichalcogenide (TMD) monolayers, such as MoS2, possess a direct optical bandgap are useful for emerging ultrathin optoelectronics in the visible light range, whereas their thin thickness limits light absorption and emission properties. To address this drawback, one promising approach is to hybridize plasmonic nanostructures with monolayer TMDs to utilize local field enhancement effects owing to localized surface plasmon resonance (LSPR). Herein, we propose a strong enhancement of the local light–matter interaction in MoS2 monolayers on naturally generated nanoscale grooves. The nanogrooves are formed at grain boundaries (GBs) of template-stripped metal film substrates that are fabricated by mechanically stripping Ag films deposited on an ultra-flat Si substrate, wherein the nanogroove densities are systematically modulated by the Ag film thickness. We observe an effective photoluminescence enhancement factor of 758 and a Raman spectroscopy intensity enhancement of approximately 5 times in MoS2 on the subwavelength-scale nanogrooves, compared with that on grain planes, which is attributed to a strong local field enhancement of the LSPR effect. Moreover, this plasmonic enhancement effect is elucidated by dark-field scattering spectroscopy and optical simulations. Our results can facilitate the utilization of density-controllable plasmonic nanogrooves synthesized without nanopatterning techniques for plasmonic hybrids on 2D semiconductors.

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