Abstract
Er-doped GaAs samples were grown by molecular beam epitaxy at 400°C and 590°C. The samples were investigated by photoluminescence (PL) and fluorescence extended X-ray absorption fine structure (EXAFS) measurements in order to find the relationship between the local structures around the Er atoms and the PL properties. Er-related PL peaks were observed only for the samples grown at a low temperature (400°C). The fluorescence EXAFS measurements showed the Er atoms were located on tetrahedral interstitial site when the growth temperature was low. On the other hand, when the growth temperature was high (590°C), the Er atoms substituted the Ga site in GaAs lattice.
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