Local Field Enhancement Characteristics in a Tapered Metal-Coated Optical Fiber Probe for Nanolithography

Abstract

In the nanolithography, some exciting developments have been motivated by the tapered metal-coated optical fiber probe irradiated by ultra-fast pulse laser. To explore the related mechanism, the local field is studied using the finite element method in this paper. The simulation results show the reflection at the cut-off plane, edge enhancement effect and surface plasmon resonance become the major factors affecting the near-field. In addition, Based on the near-field distribution and characteristics, the new promising scheme is proposed for near-field nanolithography.