Abstract
Graphical abstractDisplay Omitted Highlights? We develop facile fabrication for single crystalline Si tubular nanostructures. ? Thin metal film is thermally dewetted to form nanodots for etch mask in Si RIE. ? Redeposition of metal from nanodot during RIE produces metal rim around nanodot. ? Etch rate difference between Si and nanodot/rim results in tubular nanostructure. ? Lithography-free and large-area fabrication of tubular nanostructure is proposed. A novel method to fabricate single-crystalline silicon tubular nanostructures on large area was developed. Utilizing the thermal dewetting of a thin metal film, redeposition of dewetted metal nanodots, and etch selectivity between silicon substrate and metal masks, the tubular nanostructures were formed from single crystalline silicon substrate on large area without using any nano-patterning process. This lithography-free fabrication method composed only of sputtering, rapid thermal process and reactive ion etch (RIE) is simple and cost effective batch-process. The transmission electron microscopic inspection revealed that the silicon tubular nanostructures are in the range of 1µm in length, 250nm in diameter, 75nm in wall-thickness and 380nm in hollow-depth.
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