Lithography using nano-lens arrays made of light

Abstract

We discuss the fabrication of various one and two-dimensional chromium nanostructures. A chromium atomic beam effusing out of a thermal oven is first transversally laser cooled. This well-collimated beam is then structured and focused by the optical dipole force in a periodic light field. By introducing a substrate at the focus of the atomic beam we are able to capture this pattern directly. We discuss a few applications and challenges of this young lithography technique.