Abstract
A novel non-lithographic technique for the fabrication of carbon nanotube thin filmtransistors is presented. The whole transistor fabrication process requires onlyone mask which is used both to pattern transistor channels based on aerosolsynthesized carbon nanotubes and to deposit electrodes by metal evaporationat different angles. An important effect of electrodynamic focusing was utilizedfor the directed assembly of transistor channels with feature sizes smaller thanthe mask openings. This dry non-lithographic method opens up new avenues fordevice fabrication especially for low cost flexible and transparent electronics.
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