Abstract
In this paper, we propose a lithography alignment method based on digital image processing technology for the proximity-contact lithography system. We perform image processing such as edge detection and image segmentation on the input image to obtain the edge image of the alignment mark; then we use straight line detection to obtain the angle of the image and rotate the image; finally, we use the template of the alignment mark to perform image matching to obtain the position of the alignment mark. The algorithm is tested on a proximity-contact lithography machine. The results have proved that the algorithm can use any shape of pattern for lithography alignment and therefore is highly adaptable and has a wide range of applications.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
