Lithographic nano-patterning of colloidal nanocrystal emitters for the fabrication of waveguide photonic devices

Abstract

In this work, we show the fabrication of colloidal nanocrystals (NCs) based waveguide photonic devices by exploiting a new lithographic approach for the nano-positioning of NCs. Our approach relies on the dispersion of CdSe/ZnS core/shell NCs into a layer of electro-sensitive resist (poly-methyl methacrylate, PMMA), which is subsequently patterned by means of electron beam lithography (EBL). This localization technique has been demonstrated by detecting high-resolution photoluminescence (PL) maps on an e-beam nano-patterned PMMA/NCs film through a confocal microscope. This technique has been exploited for the fabrication of distributed feedback (DFB) structures and distributed Bragg reflectors (DBR) suitable for the realization of in-plane waveguide lasers. A DFB structure has been obtained by patterning a periodical grating on a PMMA/NCs ridge waveguide. Two DBR have been similarly fabricated by creating quarter-wavelength thick alternated stripes of air and active blend; these structures have been exploited as front and back mirrors of an in-plane PMMA/NCs ridge cavity. In both cases, no following etching processes have been required, thus simplifying the steps needed for the fabrication of NCs based active photonic devices.