Abstract
We report on the low temperature process for depositing epitaxial LiNbO3 (0001) thick films on sapphire (0001) substrates by radio-frequency magnetron sputtering. To obtain this objective, we have developed a multi-steps process. Structural studies carried out through x-ray Θ-2Θ and phi scans measurements revealed that the epitaxy is verified at a substrate temperature of 490°C whatever the film thickness. The crystalline properties and the surface morphologies are rather conserved in the multi-steps process of deposition. Optical prism coupling characterizations have been carried out to qualify the film and the interface between the film and the substrate. A discussion is proposed in relationship with transmission electron microscopy (TEM) analysis.
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