Abstract

InGaAsPGaAs(111)B pseudomorphic layers have been grown with elastic strains up to 1% and bandgaps ranging from 1.4 to 1.8 eV by liquid phase epitaxy (LPE) for the first time. Splitting of the valence band up to 50 meV was observed in these films. Photoemitters with the negative electron affinity state have been prepared by CsO activation of the strained InGaAsP films in ultrahigh vacuum (UHV).

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