Abstract
Liquid phase deposition is a method used for the nonelectrochemical production of polycrystalline ceramic films at low temperatures, most commonly silicon dioxide films. Herein, we report that silica spheres are organized in a hexagonal close-packed array using a patterned substrate. On this monolayer of silica spheres, we could fabricate new nanostructures in which deposition and etching compete through a modified LPD reaction. In the early stage, silica spheres began to undergo etching, and then, silica bridges between the silica spheres appeared by the local deposition reaction. Finally, the silica spheres and bridges disappeared completely. We propose the mechanism for the formation of nanostructure.
Highlights
Silicon dioxide (SiO2) films are widely useful in various fields
Narrow size distribution is an important factor in forming a uniform nanostructure consisting of silica spheres with a low density of defects using patterned substrates
After rubbing the silica spheres on the PDMS stamp, the monolayer of silica spheres was transferred onto the precoated silicon wafer with a 300 nm thick SiO2 layer with poly(methyl methacrylate) (PMMA)
Summary
Silicon dioxide (SiO2) films are widely useful in various fields These films act as interlayer dielectrics and gate oxides in transistors and in the fabrication of integrated circuits and ultralarge-scale integration (ULSI) technologies [1,2,3,4,5,6,7]. Many techniques to produce SiO2 films have been researched, such as thermal oxidation, chemical vapor deposition (CVD), and sputtering [7, 9, 10]. These techniques have several drawbacks, mainly the need for specific equipments such as vacuum systems or glove boxes as well as expensive and sensitive organometallic precursors [11]. Some techniques require a high reaction temperature of around several hundred degrees centigrade
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