Abstract
The thin films of silica with an organic functional group, –CH 3,–CHCH 2, –C 2H 4CF 3, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/l) was utilized. The addition of NH 4F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.
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