Abstract
Conventional ultraviolet (UV) lithography typically uses a photomask made of a fused silica plate covered with a layer of UV opaque material such as chromium. The photomask has passive binary patterns of UV opaque and UV transparent regions and the pattern is unalterable. We report a novel real-time dynamically reconfigurable photomask technology using a liquid metal (as a UV opaque material) filled in polydimethylsiloxane (PDMS, as a UV transparent material) microfluidic channels. We found that the gallium-based liquid metal (e.g. Galinstan®) is opaque in broad spectrum of light in the wavelength from 325 nm to 850 nm while the PDMS is highly transparent in this wide range of spectrum. We made both bright field and dark field microfluidic photomasks and transferred various patterns onto a positive photoresist. A 7-segment display microfluidic channel photomask was also fabricated and decimal numerals (from ‘0’ to ‘9’) were patterned with one photomask by dynamically reconfiguring decimal numeral shapes with on-demand injection and withdrawal of the liquid metal in specific segment microfluidic channels in the photomask. In addition, utilizing mechanical flexibility of the PDMS and the liquid metal, reconfiguration of the patterns in a microfluidic photomask under stretching was successfully tested.
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