Abstract
Nematic liquid crystal (NLC) alignment effects on SiNx thin film layers treated by ion-beam irradiation for three types of N ratio were successfully studied for the first time. The SiNx thin film was deposited by plasma-enhanced chemical vapor deposition using three types of N ratio. To characterize the film, atomic force microscopy was performed. Good LC aligning capabilities on the SiNx thin film treated by ion-beam irradiation for all N ratios can be achieved. The low pretilt angle for an NLC on the SiNx thin film treated by ion-beam irradiation was observed and could be adopted in planar alignment liquid crystal display applications as in-plane switching and fringe-field switching modes.
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