Line shape engineering of sharp Fano resonance in Al-based metal-dielectric multilayer structure

Abstract

A systematic experimental study was performed on the Fano line shape exhibited by multilayer structures consisting of an Al layer, a SiO2 spacer layer, and an Al2O3 waveguide layer. In the structures studied, a sharp Fano resonance appears on the background of broad asymmetric resonance attributed to the excitation of a surface plasmon polariton at the Al/SiO2 interface. It is shown that the background asymmetric surface plasmon resonance can be well fitted to a single Fano function, and the sharp Fano line shape can be well fitted to a double Fano function expressed as a product of two single Fano functions. The results of measurements performed by varying the spacer layer thickness indicate that the width (Q factor) of the sharp Fano resonance decreases (increases) monotonously as the thickness increases. The Q factor achieved in the present study is as high as ∼1500. A comparison with the results of electromagnetic calculations suggests that not only the spacer layer thickness but also the imaginary part of the dielectric constant of the waveguide layer plays an important role in the Fano line shape engineering.