Limitations on ultra-thin multilayers: pulsed cathodic arc and computer simulation

Abstract

Nanoscale metallic multilayers have been deposited by a pulsed double-cathodic arc deposition with varying thicknesses of each layer from a few to tens of angstroms and examined by cross-sectional transmission electron microscopy (XTEM). TRIDYN computer simulations are performed to get a better understanding of the nanoscale deposition of multilayers during the cathodic arc deposition process. Their results are compared with the experimental data. For the higher ion fluence (>1.0×10 16 ions/cm 2) and larger bilayer thickness (>2 nm), the periodicity of multilayers was good. However, the results of the simulations for the lower ion flux and smaller bilayer thickness reveal that the individual layers are intermixed and diffused. The experimental results are in good agreement with those of simulations that the limit of bilayer period of the ultra-thin multilayers is approximately 2 nm in the present case.