Abstract
The design, fabrication, and testing of a microelectromechanical system (MEMS) optical modulator is presented. Polarization effects of noncircular holes on reflectivity are examined. Thermal nanoimprint lithography is used to form an array of 150nm diameter nanoholes in a 60nm thick metal film on a silicon-on-insulator wafer. A quartz superstrate with an indium tin oxide electrode and a photoresist spacer is used to electrostatically actuate the MEMS pixel. The motion of the pixel in relation to the superstrate causes shifts in the wavelengths of optical interference from the periodic nanohole array. An optical modulation depth of over 67% is demonstrated with this modulation method. Dynamic modal analysis is also presented.
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