Abstract
We have investigated the kinetics of light-induced defect (dangling bond) creation and annealing processes in a-Si:H containing a large amount of hydrogen at 300 K and 77 K using the ESR technique. We have obtained direct evidence for the light-induced annealing of dangling bonds at 300 K. A model, in which nonradiative recombination of electrons and holes at hydrogen-related dangling bonds is taken into account, is presented to interpret the experimental results.
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