Abstract
The paper is concerned with the effectiveness of the lift-off process in pattern definition of ultra-thin nanocrystalline quantum dot (NQD) films. The lift-off process is implemented and investigated in conjunction with mist deposition and spin coating of NQD films. The lift-off process is preformed in gas-phase (oxygen plasma exposure) and liquid-phase (acetone immersion). The results of NQD patterned films using lift-off process are presented and discussed in terms of performance of the lift-off medium (dry and wet), resolution of the pattern transfer process, as well as photoresist thickness. It demonstrates that while fully compatible with the mist deposition, the patterning scheme proposed is not compatible with spin coating of NQDs films.
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