LCVD with Copper Vapour and Copper Bromide Vapour Lasers — Review

Abstract

Recently, metal organic chemical vapor deposition (MOCVD) has become a successful competitor to the classical sputtering method for aluminium [1]. Information concerning the photolytic decomposition of Al alkyls with excimer laser radiating in the UV range of wavelengths predominates in the literature, while experiments on the basis of pyrolysis of these compounds by laser emission are treated in far fewer papers. Besides, there is no definite answer as to what is the mechanism of thermal decomposition of trimethylaluminium. In the literature there is a lack of information concerning the use of pulsed visible lasers and in particular a Copper Vapour Laser (CVL) or Copper Bromide Vapour Laser (CBVL) in the wavelength range 510 – 578 nm for LCVD of any materials. This has motivated our research into the activation of chemical processes by such a laser for deposition of aluminium and silicon.