Abstract
Thin-film crystalline photovoltaic (PV) cell is a trend for future PV with its potential to achieve low cost and high efficiency. Concerning material utilization efficiency, we propose a method with a fast manufacturing method of thin crystalline Si by chemical solution. To obtain the highest efficiency of material utilization, experiments with different H 2 O 2 /HF ratio are conducted, where related mechanisms are discussed. Moreover, large-area (87.7 mm2) thin film transferred to glass is demonstrated, and with embedded nanohole structure, lowest optical reflectance of 0.26% is measured. These characteristics show that the fabricated thin film has potential for large-area crystalline thin film PV.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
