Abstract
A new method based on the scan line method and a computer program for extracting parasitic effects from mask layout data have been developed and are integrated in a design environment. This method and the design environment are presented. With this method the coupled lines and the discontinuities among N interconnection lines can be found in time proportional to (N+I)log N, where I is the number of objects to be found. The details of the proposed algorithms and test results are given. >
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