Abstract
In the present work, the lattice Boltzmann method is employed to simulate the ultra-fast laser heating of a thin silicon film with nano-scale thickness. Our results show that the heat conduction in thin silicon films heated by ultra-fast lasers exhibits wavelike behavior which is significantly influenced by the boundary conditions at the film's surfaces. We also find that simultaneously heating both surfaces of a thin silicon film by ultra-fast lasers can induce two thermal waves traveling in the opposite directions and their interaction may cause significant temperature rise in the middle region of the thin film. Furthermore, by varying the heating delay time between two surfaces of a thin film one can change the position where the energy density achieves the highest value.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
