Abstract
The DUV-VUV laser microlithography technology is main player from 250 nm to 70 nm node LSI patterningprocess. Trend of DUV light source device for micro-lithography is described. Also this paper reports thetechnical issues of VUV laser microlithography and F2 laser light source, and introduces the technical approachand some latest results of the F2 lithography technology development project in ASET.
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