Abstract
SIMS depth profiles for full wafer analyses were carried out on the CAMECA IMS Wf instrument. Experiments have been performed in order to investigate the analytical performance of this SIMS instrument for shallow, medium and deep profiles in terms of measurement repeatability and sample throughput. First results using a cassette loader option implemented on the IMS Wf are presented.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
